Abstract
The transversal and longitudinal resistance in the quantum Hall effect regime was measured in a Si MOSFET sample in which a slot-gate allows one to vary the electron density and filling factor in different parts of the sample. In case of unequal gate voltages, the longitudinal resistances on the opposite sides of the sample differ from each other because the originated Hall voltage difference is added to the longitudinal voltage only on one side depending on the gradient of the gate voltages and the direction of the external magnetic field. After subtracting the Hall voltage difference, the increase in longitudinal resistance is observed when electrons on the opposite sides of the slot occupy Landau levels with different spin orientations.
Keywords
condensed matter, mesoscale, nanoscale physics, electron transport, slot-gate Si MOSFET, transversal, longitudinal resistance, quantum Hall effect regime
Subject Categories
Condensed matter
Disciplines
Physics
Publication Date
2008
Permanent URL
Recommended Citation
Shlimak, I.; Ginodman, V.; Butenko, A.; Friedland, K.-J.; and Kravchenko, S. V., "Electron transport in a slot-gate Si MOSFET" (2008). Physics Faculty Publications. Paper 167. http://hdl.handle.net/2047/d20000778
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Notes
Originally posted at http://arxiv.org/abs/0803.4432v1. Preprint of an article published in EPL (Europhysics Letters), v.82 no.4, 2008.