Abstract

In this paper we introduce a new technique for measuring the saturation magnetostriction constant (λs) for isotropic polycrystalline thin films. The technique makes use of nonresonant planar microwave structures together with a novel stressing mechanism to induce a shift in the resonant field of a magnetic thin film as measured by a ferromagnetic resonance (FMR) experiment. Measurement of the shift induced by a uniaxial stress allows for determination of λs via a magnetic resonance analysis. Either a slotline device or coplanar waveguide (CPW) was used as the source of the microwave excitation field depending upon the orientation of the dc magnetic field. To evaluate the technique, polycrystalline Ni films of thickness of 637 nm were sputtered onto glass substrates at room temperature for comparison with the literature. Using a 50‐Ω CPW, FMR measurements at 9 GHz revealed an average value of λs of −36 × 10⁻⁶ a value in agreement with those previously reported. The technique provides increased flexibility over other FRM techniques as it is wideband and directly accessible.

Notes

The following article appeared in Bushnell, S.E., Nowak, W.B., Oliver, S.A., & Vittoria, C. (1992). The measurement of magnetostriction constants of thin films using planar microwave devices and ferromagnetic resonance. Review of Scientific Instruments, 63(3), 2021-2025.

Keywords

saturation magnetostriction constant, isotropic polycrystalline thin films

Disciplines

Industrial Engineering | Mechanical Engineering

Publisher

American Institute of Physics

Publication Date

3-1992

Rights Information

Copyright 1992 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

Rights Holder

American Institute of Physics

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