Abstract
We have implanted boron ions into films of Fe-Ni alloy composition. A homogeneous distribution of boron was determined from the sputter Auger analysis with a concentration of 18% and 34% for low- and high-dose implantation, respectively. The resistivity of film was increased by a factor of 2 and 4 as a result of low- and high-dose implantation, respectively. The magnetic properties of these films are studied as a function of annealing temperature by using FMR measurements. Both the uniaxial anisotropy field and FMR linewidth are dramatically decreased as a result of annealing at elevated temperatures. The changes of effective magnetization of these films are strongly dependent on implanted boron concentration.
Keywords
Boron Implantation, Iron-Nickel Films
Disciplines
Industrial Engineering | Mechanical Engineering
Publisher
American Institute of Physics
Publication Date
4-15-1988
Rights Information
Copyright 1988 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Rights Holder
American Institute of Physics
Permanent URL
Recommended Citation
Ryu, J.; Castell, K.; Nowak, W.; and Vittoria, C., "Effects of boron implantation in films of iron-nickel" (1988). Mechanical and Industrial Engineering Faculty Publications. Paper 30. http://hdl.handle.net/2047/d20000721
Click button above to open, or right-click to save.
Notes
The following article appeared in Ryu, J., Castell, K., Nowak, W., & Vittoria, C. (1988). Effects of boron implantation in films of iron-nickel. Journal of Applied Physics, 63(8), 4312-4314.