Abstract

We have implanted boron ions into films of Fe-Ni alloy composition. A homogeneous distribution of boron was determined from the sputter Auger analysis with a concentration of 18% and 34% for low- and high-dose implantation, respectively. The resistivity of film was increased by a factor of 2 and 4 as a result of low- and high-dose implantation, respectively. The magnetic properties of these films are studied as a function of annealing temperature by using FMR measurements. Both the uniaxial anisotropy field and FMR linewidth are dramatically decreased as a result of annealing at elevated temperatures. The changes of effective magnetization of these films are strongly dependent on implanted boron concentration.

Notes

The following article appeared in Ryu, J., Castell, K., Nowak, W., & Vittoria, C. (1988). Effects of boron implantation in films of iron-nickel. Journal of Applied Physics, 63(8), 4312-4314.

Keywords

boron implantation, iron-nickel films

Disciplines

Industrial Engineering | Mechanical Engineering

Publisher

American Institute of Physics

Publication Date

4-15-1988

Rights Information

Copyright 1988 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

Rights Holder

American Institute of Physics

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