Abstract
Epitaxial Y3Fe₅O₁₂ (YIG) films have been grown by the pulsed laser deposition (PLD) technique on (111) gadolinium gallium garnet substrates. The effect of substrate temperature and oxygen partial pressure on the structure, composition, and magnetic properties of the films was investigated and compared to liquid phase epitaxy YIG films. The results demonstrated that epitaxial YIG films could be prepared under a wide range of deposition conditions, but narrow linewidth (ΔH ≃1 Oe) films were producible only at low oxygen partial pressures (O₂ < 250 mTorr) and relatively high substrate temperatures (TS > 800°C). Since the linewidth of single-crystal YIG is dominated by surface and volume defects and/or impurities, the narrow linewidth indicated that PLD is a viable technique for producing high-quality ferrite films for microwave device applications. In addition, under all deposition conditions (50-1000 mTorr and 700-850°C) there is a uniaxial axis perpendicular to the film plane. However, at low oxygen pressure the uniaxial anisotropy energy constant Ku is negative while at high oxygen pressure Ku is positive.
Keywords
PLD, epitaxial yttrium-iron-garnet films, Y3Fe₅O₁₂, YIG, gadolinium gallium garnet substrates
Subject Categories
Thin films, Pulsed laser deposition, Epitaxy, Magnetic properties
Disciplines
Electromagnetics and photonics
Publisher
American Institute of Physics
Publication Date
7-15-1993
Rights Information
Copyright 1993 American Institute of Physics.
Rights Holder
American Institute of Physics
Permanent URL
Recommended Citation
Dorsey, P. C.; Bushnell, S. E.; Seed, R. G.; and Vittoria, C., "Epitaxial yttrium-iron-garnet films grown by pulsed-laser deposition" (1993). Electrical and Computer Engineering Faculty Publications. Paper 44. http://hdl.handle.net/2047/d20002215
Click button above to open, or right-click to save.
Notes
Originally published in Journal of Applied Physics 74, 1242 (1993). DOI:10.1063/1.354927 (http://dx.doi.org/10.1063/1.354927).