Alternate Title

Proposal #6: particle adhesion and removal for post-CMP applications

Notes

Proposal #6 from the Center for Nano and Microcontamination Control published in 2002. 2 pages.

Keywords

CMP, clean

Subject Categories

Particles, Chemical mechanical planarization

Disciplines

Materials Science and Engineering | Nanoscience and Nanotechnology

Publisher

Northeastern University

Publication Date

2002

Rights Holder

Northeastern University



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