Keywords
CMP, cleaning, surface concentration
Subject Categories
Chemical mechanical planarization, Surfaces (Technology)
Disciplines
Materials Science and Engineering | Nanoscience and Nanotechnology
Publisher
Northeastern University
Publication Date
2002
Rights Holder
Northeastern University
Recommended Citation
Busnaina, Ahmed A., "The removal of submicron particles using CO2 aerosol with emphasis on post-CMP applications" (2002). Center for Nano and Microcontamination Control Proposals. Paper 2.
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COinS
Notes
A Center for Nano and Microcontamination Control proposal published in 2002. 3 pages.