Alternate Title

Proposal #4: the mechanics of CMP and post-CMP cleaning

Notes

Center for Nano and Microcontamination Control Proposal #4 published in 2002. 2 pages.

Keywords

CMP cleaning, particles

Subject Categories

Chemical mechanical planarization, Surfaces (Technology)

Disciplines

Materials Science and Engineering | Nanoscience and Nanotechnology

Publisher

Northeastern University

Publication Date

2002

Rights Holder

Northeastern University



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