Proposal #4: the mechanics of CMP and post-CMP cleaning
CMP cleaning, particles
Chemical mechanical planarization, Surfaces (Technology)
Materials Science and Engineering | Nanoscience and Nanotechnology
Müftü, Sinan; Busnaina, Ahmed A.; and Adams, George G., "The mechanics of CMP and post-CMP cleaning" (2002). Center for Nano and Microcontamination Control Proposals. Paper 1.
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