Submissions from 2002
Particle adhesion and removal for post-CMP applications, George G. Adams, Ahmed A. Busnaina, and Sinan Müftü
Nano and microscale particle removal, Ahmed A. Busnaina
The removal of submicron particles using CO2 aerosol with emphasis on post-CMP applications, Ahmed A. Busnaina
The transport of contaminants in thin film deposition processes, John Cipolla, Ahmed A. Busnaina, and Nicol E. McGruer
The mechanics of CMP and post-CMP cleaning, Sinan Müftü, Ahmed A. Busnaina, and George G. Adams
Submissions from 2001
Physical cleaning of submicron trenches, a modeling study, Ahmed A. Busnaina
Techniques for finding and characterizing defects and contaminants, Nathan E. Israeloff and Ahmed A. Busnaina
Development of a MEMs based micro gas analysis system, Nicol E. McGruer and Jeffrey A. Hopwood
Establishing an IUCRC center for microcontamination control at Northeastern University: a planning meeting proposal, Northeastern University - Center for Nano and Microcontamination Control
