Abstract

We report a technique to characterize adhesion of monolayered/multilayered graphene sheets on silicon wafer. Nanoparticles trapped at graphene-silicon interface act as point wedges to support axisymmetric blisters. Local adhesion strength is found by measuring the particle height and blister radius using a scanning electron microscope. Adhesion energy of the typical graphene-silicon interface is measured to be 151±28 mJ/m2. The proposed method and our measurements provide insights in fabrication and reliability of microelectromechanical/nanoelectromechanical systems.

Notes

Originally published in Journal of Applied Physics v.107 no.2 (2010), p.026104. doi:10.1063/1.3294960

Keywords

adhesion, elemental semiconductors, graphene, multilayers, nanoparticles, scanning electron microscopy, silicon

Subject Categories

Integrated circuits - Wafer-scale integration, Graphene, Nanoparticles

Disciplines

Electronic Devices and Semiconductor Manufacturing | Nanoscience and Nanotechnology

Publisher

American Institute of Physics

Publication Date

1-29-2010

Rights Information

Copyright 2010

Rights Holder

American Institute of Physics

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