Abstract
We report a technique to characterize adhesion of monolayered/multilayered graphene sheets on silicon wafer. Nanoparticles trapped at graphene-silicon interface act as point wedges to support axisymmetric blisters. Local adhesion strength is found by measuring the particle height and blister radius using a scanning electron microscope. Adhesion energy of the typical graphene-silicon interface is measured to be 151±28 mJ/m2. The proposed method and our measurements provide insights in fabrication and reliability of microelectromechanical/nanoelectromechanical systems.
Keywords
adhesion, elemental semiconductors, graphene, multilayers, nanoparticles, scanning electron microscopy, silicon
Subject Categories
Integrated circuits - Wafer-scale integration, Graphene, Nanoparticles
Disciplines
Electronic Devices and Semiconductor Manufacturing | Nanoscience and Nanotechnology
Publisher
American Institute of Physics
Publication Date
1-29-2010
Rights Information
Copyright 2010
Rights Holder
American Institute of Physics
Permanent URL
Recommended Citation
Zong, Zong; Chen, Chia-Ling; Dokmeci, Mehmet R.; and Wan, Kai-tak, "Direct measurement of graphene adhesion on silicon surface by intercalation of nanoparticles" (2010). Center for High-Rate Nanomanufacturing Publications. Paper 19. http://hdl.handle.net/2047/d20000965
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Additional Files
figure1.zip (1854 kB)Figure 1
figure2.zip (1544 kB)
Figure 2
Included in
Electronic Devices and Semiconductor Manufacturing Commons, Nanoscience and Nanotechnology Commons
Notes
Originally published in Journal of Applied Physics v.107 no.2 (2010), p.026104. doi:10.1063/1.3294960