Abstract
Next generation magnetic microwave devices require ferrite films to be thick (>300 μm), self-biased (high remanent magnetization), and low loss in the microwave and millimeter wave bands. Here we examine recent advances in the processing of thick Ba-hexaferrite (M-type) films using pulsed laser deposition (PLD), liquid-phase epitaxy, and screen printing. These techniques are compared and contrasted as to their suitability for microwave materials processing and industrial production. Recent advances include the PLD growth of BaM on wide-band-gap semiconductor substrates and the development of thick, self-biased, low-loss BaM films by screen printing.
Keywords
Ba-hexaferrite films, pulsed laser deposition
Subject Categories
Ferrites, Thin films, Microwave devices
Disciplines
Chemical Engineering | Electrical and Computer Engineering
Publisher
American Institute of Physics
Publication Date
4-2006
Rights Information
Copyright 2006
Rights Holder
American Institute of Physics
Permanent URL
Recommended Citation
Harris (1962-), Vincent Girard; Chen, Zhaohui; Chen, Yajie; Yoon, Soack Dae; Sakai, Tomokuza; Geiler, Anton; Yang, Aria Fan; He, Yongxue; Ziemer, Katherine S.; Sun, Nian X.; and Vittoria, C., "Ba-hexaferrite films for next generation microwave devices" (2006). Chemical Engineering Faculty Publications. Paper 8. http://hdl.handle.net/2047/d20000713
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Notes
Originally published in Journal of Applied Physics, vol.99, no.8, April 2006. doi: 10.1063/1.2165145